发明名称 POLISHING COMPOSITION AND METHOD
摘要 TO PROVIDE A POLISHING COMPOSITION WHICH ENABLES MAINTENANCE OF EXCELLENT PROPERTIES AND HIGH QUALITY OF THE SURFACE OF A HARD DISK WITHOUT LOWERING POLISHING RATE DURING POLISHING OF THE SURFACE,AND WHICH CAN PROVIDE A POLISHED SURFACE IN WHICH THE AMOUNT OF DUB-OFF IS CONSIDERABLY REDUCED AS COMPARED WITH THAT OF A CONVENTIONAL LEVEL,A POLISHING COMPOSITION CONTAINING WATER,A POLISHING MATERIAL (PARTICULARLY ALUMINA),A POLISHING ACCELERATOR,AND AT LEAST ONE OF HYDROXYPROPYL CELLULOSE AND HYDROXYALKYL ALKYL CELLULOSE IS PROVIDED.
申请公布号 MY127884(A) 申请公布日期 2006.12.29
申请号 MY2000PI04576 申请日期 2000.09.29
申请人 SHOWA DENKO K.K.;YAMAGUCHI SEIKEN KOGYO K.K. 发明人 KEN ISHITOBI;MASAHIRO NOZAKI;TADANORI NAGAO;YOSHIKI HAYASHI
分类号 B24B1/00;B24B57/02;B24B37/00;C09G1/02;C09K3/14;G11B5/84 主分类号 B24B1/00
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