发明名称 PHOTOSENSITIVE RESIN COMPOSITION, PHOTOSENSITIVE ELEMENT USING THE SAME, RESIST PATTERN FORMING METHOD AND METHOD FOR PRODUCING PRINTED WIRING BOARD
摘要 <P>PROBLEM TO BE SOLVED: To provide a photosensitive resin composition and a photosensitive element having satisfactory sensitivity, and to provide a resist pattern forming method excellent in work efficiency and useful to achieve higher density of printed wiring and a method for producing a printed wiring board useful to achieve higher density of printed wiring. <P>SOLUTION: The photosensitive resin composition contains (A) a binder polymer, (B) a photopolymerizable compound having at least one polymerizable ethylenically unsaturated group within a molecule and (C) a photopolymerization initiator, wherein the component (C) contains at least one photopolymerization initiator selected from the group of imidazole dimers each having substituents each having an alkylene glycol group. <P>COPYRIGHT: (C)2007,JPO&INPIT
申请公布号 JP2006350277(A) 申请公布日期 2006.12.28
申请号 JP20050262584 申请日期 2005.09.09
申请人 HITACHI CHEM CO LTD 发明人 RAI HANAKO;KAJI MAKOTO;SHI YONG-TAO;IN KETSU
分类号 G03F7/028;G03F7/004;G03F7/027;H05K3/06;H05K3/18 主分类号 G03F7/028
代理机构 代理人
主权项
地址
您可能感兴趣的专利