发明名称 |
PHOTOSENSITIVE RESIN COMPOSITION, PHOTOSENSITIVE ELEMENT USING THE SAME, RESIST PATTERN FORMING METHOD AND METHOD FOR PRODUCING PRINTED WIRING BOARD |
摘要 |
<P>PROBLEM TO BE SOLVED: To provide a photosensitive resin composition and a photosensitive element having satisfactory sensitivity, and to provide a resist pattern forming method excellent in work efficiency and useful to achieve higher density of printed wiring and a method for producing a printed wiring board useful to achieve higher density of printed wiring. <P>SOLUTION: The photosensitive resin composition contains (A) a binder polymer, (B) a photopolymerizable compound having at least one polymerizable ethylenically unsaturated group within a molecule and (C) a photopolymerization initiator, wherein the component (C) contains at least one photopolymerization initiator selected from the group of imidazole dimers each having substituents each having an alkylene glycol group. <P>COPYRIGHT: (C)2007,JPO&INPIT |
申请公布号 |
JP2006350277(A) |
申请公布日期 |
2006.12.28 |
申请号 |
JP20050262584 |
申请日期 |
2005.09.09 |
申请人 |
HITACHI CHEM CO LTD |
发明人 |
RAI HANAKO;KAJI MAKOTO;SHI YONG-TAO;IN KETSU |
分类号 |
G03F7/028;G03F7/004;G03F7/027;H05K3/06;H05K3/18 |
主分类号 |
G03F7/028 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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