| 摘要 |
PROBLEM TO BE SOLVED: To provide a method of beam correction where a difference is not generated between line widths in (x) direction and (y) direction, regardless of deflection coma aberrations and deflection chromatic aberrations, and to provide a charged particle beam lithographic apparatus. SOLUTION: The charged particle beam lithographic device carries out dynamic focal correction and dynamic astigmatic correction regarding a beam. The device is provided with a beam correction means for carrying out the dynamic focal correction (110) and the dynamic astigmatic correction (120), by adding (323, 323) a focal deviation amount (312) and astigmatic deviation amount (322) for eliminating the difference between the (x) direction and the (y) direction of beam blurring, caused by the deflection coma aberration and the deflection chromatic aberration, respectively, to a correction value (321) for the dynamic focal correction and a correction value (321) for the dynamic astigmatic correction. COPYRIGHT: (C)2007,JPO&INPIT
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