发明名称 CMOS IMAGE SENSOR AND METHOD FOR MANUFACTURING THE SAME
摘要 PROBLEM TO BE SOLVED: To provide a CMOS image sensor capable of preventing the deterioration in the matching characteristic of a drive transistor due to downsizing and of ensuring the reliability of a first metal contact with the gate of the drive transistor, and a method for manufacturing the same. SOLUTION: The CMOS image sensor includes a reset transistor, a select transistor, a drive transistor, and a photodiode, a line-shaped active region, a gate electrode of the drive transistor arranged so as to intersect the active region, a shielding film situated between the active region and the gate electrode in a region in which the active region and the gate electrodes intersect each other, and a metal contact prevented from the electric short circuit with the active region of a substrate by the shielding film and electrically connected to the gate electrode. COPYRIGHT: (C)2007,JPO&INPIT
申请公布号 JP2006352142(A) 申请公布日期 2006.12.28
申请号 JP20060167857 申请日期 2006.06.16
申请人 MAGNACHIP SEMICONDUCTOR LTD 发明人 HO WON-JOON;LEE KYUNG-LAK
分类号 H01L27/146;H04N5/335;H04N5/374 主分类号 H01L27/146
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