发明名称 PHOTOSENSITIVE COMPOSITION AND BLACK MATRIX
摘要 <p>Photosensitive composition including photo-polymerization initiator is provided to be applicable in forming black matrix pattern with high linearity, less film stripping or residue and excellent display contrast by introducing the photo-polymerization initiator with excellent light sensitivity in the composition, thereby improving contrast and color development of a color filter. The photosensitive composition includes photo-polymeric compound, photo-polymerization initiator and light shielding material. The photo-polymerization initiator comprises: (a) a compound represented by the formula(1), wherein X is groups represented by the formula(2) and (3), R1 is at least one selected from a group consisting of phenyl, alkyl having carbon atoms ranging from 1 to 20, -CN, -NO2 and haloalkyl having carbon atoms ranging from 1 to 4, and R2 is acyl group having carbon atoms ranging from 2 to 12 or alkenoyl group having carbon atoms ranging from 4 to 6; and (b) a compound having nitrogen-containing heterocylcic ring which is bonded with mercapto group.</p>
申请公布号 KR20060134809(A) 申请公布日期 2006.12.28
申请号 KR20060054816 申请日期 2006.06.19
申请人 TOKYO OHKA KOGYO CO., LTD. 发明人 SHIDA MASARU;KONDO MITSURU;UCHIKAWA KIYOSHI
分类号 G03F7/004;G03F7/028 主分类号 G03F7/004
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