发明名称 POLISHING SURFACE DRESSING METHOD OF POLISHING DEVICE
摘要 <P>PROBLEM TO BE SOLVED: To provide a polishing device making pressurizing force of a dresser tool to a polishing pad or a polishing plate less than pressurizing force by a dead load of the dresser tool in dressing and carrying out dressing with less consumption of the polishing pad or the polishing plate. <P>SOLUTION: This polishing device furnished with: a turn table 1 having the polishing pad 2 or the polishing plate including abrasive grains; and a top ring 3 to hold a ground substrate, is furnished with: the dresser tool 5 to dress a polishing surface by making contact with the polishing surface of the polishing pad 2 or the polishing plate; a dresser shaft 6; a controller 8 controlling the pressurizing force of the polishing pad 2 or the polishing plate of the dresser tool 5 on the polishing surface from a specified value lower than the pressurizing force by the dead load of the dresser tool 5 to an optional value higher than it; and a pressurizing force controlling means made of a regulator 10. <P>COPYRIGHT: (C)2007,JPO&INPIT
申请公布号 JP2006346859(A) 申请公布日期 2006.12.28
申请号 JP20060231296 申请日期 2006.08.28
申请人 EBARA CORP 发明人 KIMURA NORIO;SONE CHUICHI
分类号 B24B37/00;B24B53/00;B24B53/017;B24B53/02;H01L21/304 主分类号 B24B37/00
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