| 摘要 |
An apparatus for cleaning a wafer is provided to prevent a wafer from being transferred by making a pulley for transferring rotation power of a rotation part run idle even if the elasticity of a conveyor belt decreases and the conveyor belt extends in a lengthwise direction. Upper and lower brushes(520,540) polish the upper and the lower surface of a wafer(800). The wafer polished by the upper and the lower brushe is rotated by a toggle roller(560). A plurality of conveyor belts(550) are disposed in the toggle roller, horizontally transferring or returning the wafer while supporting both edges of the wafer. The conveyor belt receives rotation power of a rotation part for supplying predetermined rotation force and rotates along an orbit centering around at least one rotating pulley, having a structure gearing with a shape formed on the outer circumferential surface of the pulley. The conveyor belt has an inner lateral surface in which saw-type bending or a groove gearing with the pulley having a saw-type outer circumferential surface.
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