Photosensitive composition, pattern forming method using the photosensitive composition and compound for use in the photosensitive composition

摘要

A photosensitive composition comprising a compound capable of generating a compound having a specific structure upon irradiation with actinic rays or radiation; a pattern forming method using the photosensitive composition; a compound having a specific structure; and a compound capable of generating a compound having a specific structure upon irradiation with actinic rays or radiation.
The specific structure is:
A-R-X-F (I)
wherein X represents -CO- or SO 2 -;
R represents a divalent linking group; and
A represents an acidic group.