发明名称 Acidic treatment liquid and method of treating copper surfaces
摘要 The present invention relates to a solution and to a method of treating copper surfaces, the copper surfaces being brought into contact with an acidic treatment liquid which contains hydrogen peroxide and at least one five-membered heterocyclic compound as well as additionally at least one microstructure modifying agent selected from the group comprising thioles A, disulfides B, sulfides C and thioamides D having the following respective general formulae: wherein R<SUP>1 </SUP>and R<SUP>2</SUP>=alkyl, alkenyl, aryl, aralkyl, especially benzyl, cycloalkyl and the derivatives thereof and R<SUP>3</SUP>=R<SUP>1</SUP>, R<SUP>1</SUP>-O, R<SUP>1</SUP>-S, amino or substituted amino, wherein R<SUP>1 </SUP>and R<SUP>2 </SUP>may especially be phenyl or substituted phenyl.
申请公布号 US7153449(B2) 申请公布日期 2006.12.26
申请号 US20020311395 申请日期 2002.12.13
申请人 ATOTECH DEUTSCHLAND GMBH 发明人 HAUF UWE;FUERHAUPTER HARRY;STIOP ALEXEY;GRIESER UDO
分类号 C09K13/00;C23C22/52;C23F1/18;H05K3/06;H05K3/28;H05K3/38 主分类号 C09K13/00
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