APPARATUS FOR DEPOSITING PARTICLES FOR MANUFACTURING A STANDARD WAFER

摘要

A deposition apparatus is provided to economize a contaminant solution and to reduce a working time by contaminating uniformly a wafer surface using an aerosol spraying unit. A deposition apparatus includes a chamber(10) for storing a wafer, an aerosol spraying unit(20) for spraying a contaminant solution onto the wafer of the chamber, a contaminant solution supply unit for supplying the contaminant solution to the aerosol spraying unit, an inert gas supply unit for floating uniformly contaminant grains in the chamber, and a rotating unit. The rotating unit is used for rotating the wafer.