发明名称 VERTICAL CVD APPARATUS
摘要 PROBLEM TO BE SOLVED: To provide a vertical CVD apparatus excellent in earthquake protection capable of reducing regular replacement frequency of tools, and capable of forming an oxide film excellent in planar uniformity and in-furnace uniformity on a substrate to be processed. SOLUTION: The vertical CVD apparatus includes a vertically held outer tube, an inner tube 1 concentrically located inside the outer tube, a cover boat provided inside the inner tube 1 for holding a plurality of substrates to be processed, and a boat cover 2 provided inside the inner tube and provided oppositely to the cover boat. The boat cover 2 is fixed to the inner tube 1 at its upper and lower ends. An opening for supplying a film formation gas supplied into the inner tube 1 into a space formed between the boat cover 2 and the inner tube 1 is provided in a radial cross section of the inner tube 1 where the lower end of the boat cover 2 is fixed to the inner tube 1. COPYRIGHT: (C)2007,JPO&INPIT
申请公布号 JP2006339564(A) 申请公布日期 2006.12.14
申请号 JP20050165173 申请日期 2005.06.06
申请人 KAWASAKI MICROELECTRONICS KK 发明人 SHIRAISHI TADAYOSHI;KOMATSU IKUO
分类号 H01L21/31 主分类号 H01L21/31
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