System und Methode zur Reduzierung der Rundung der Ecken eines Maskenmusters während der Herstellung von Masken

摘要

A method for fabricating mask patterns in accordance with the present invention includes the steps of providing a mask blank (122) for patterning, propagating a laser/electron beam (120) having an elliptical cross-sectional shape onto the mask blank, the elliptical cross-sectional shape having an elongated axis and edges at opposite ends of the elongated axis and positioning the mask blank to write a pattern on the mask blank wherein the positioning includes employing the edges of the elliptical cross-sectional shape of the laser/electron beam to write corners (124) of the pattern. A system is also included.