发明名称 SOLID STATE IMAGING DEVICE AND MANUFACTURING METHOD THEREOF
摘要 PROBLEM TO BE SOLVED: To provide a solid state imaging device of which a light shielding layer has a sufficiently low spectral transmittance across the entire wavelength range. SOLUTION: The solid state imaging device comprises a semiconductor substrate 1 on which a solid state imaging element having a plurality of photoelectric converters 2 is formed, a light shielding film 4 which covers the semiconductor substrate and is provided with an opening above the photoelectric converter, a flattened layer 5 formed on the opening and light shielding film, and a plurality of light shielding layers 7 having spectral transmittance characteristics different from each other stacked on the flattened layer with an opening provided on the photoelectric converter. The plurality of light shielding layers are combined to provide a specified spectral transmittance characteristics. COPYRIGHT: (C)2007,JPO&INPIT
申请公布号 JP2006339377(A) 申请公布日期 2006.12.14
申请号 JP20050161701 申请日期 2005.06.01
申请人 MATSUSHITA ELECTRIC IND CO LTD 发明人 OKAMOTO HIROSHI
分类号 H01L27/14 主分类号 H01L27/14
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