| 摘要 |
<P>PROBLEM TO BE SOLVED: To propose an exposure apparatus for always placing a photosensitive substrate in the temperature almost equal to that of a substrate holder on the substrate holder, even when temperature of the substrate holder rises through repetition of the exposure process. <P>SOLUTION: The exposure apparatus EX for executing the exposure process to the substrate W held by a substrate holding part WT is provided with a temperature calculator C1 for obtaining temperature of the substrate holder WH which is changing with the exposure process and a substrate temperature adjuster 50 for adjusting temperature of the substrate W on the basis of temperature of the substrate holder WH obtained by the temperature calculator C1. <P>COPYRIGHT: (C)2007,JPO&INPIT |
