POSITIVE PHOTORESIST COMPOSITION FOR MANUFACTURING SUBSTRATE AND METHOD FOR FORMING RESIST PATTERN,申请号KR20040043715-传众专利搜索

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发明名称	POSITIVE PHOTORESIST COMPOSITION FOR MANUFACTURING SUBSTRATE AND METHOD FOR FORMING RESIST PATTERN
摘要
申请公布号	KR100656136(B1)	申请公布日期	2006.12.13
申请号	KR20040043715	申请日期	2004.06.14
申请人		发明人
分类号	G03F7/022;G03F7/004;G03F7/039;G03F7/26;H01L21/027	主分类号	G03F7/022
代理机构		代理人
主权项
地址

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