发明名称 Level sensor, lithographic apparatus and device manufacturing method
摘要 The invention relates to a level sensor for use in a lithographic apparatus that determines a surface height of a substrate. The level sensor includes an emitter and a receiver, wherein the emitter is arranged to emit a signal directed to a predetermined position on the surface of the substrate, such that the signal is at least partially reflected by the substrate to render a reflected signal. The receiver is arranged to receive at least part of the reflected signal, and the level sensor is arranged to determine the surface height of the substrate with respect to the level sensor based on the emitted and received signal. The signal includes a pressure wave.
申请公布号 US7148494(B2) 申请公布日期 2006.12.12
申请号 US20040022593 申请日期 2004.12.29
申请人 ASML NETHERLANDS B.V. 发明人 BRUINSMA ANASTASIUS JACOBUS ANICETUS;STAALS FRANK;VAN WIJK ROBERT JAN;NIHTIANOV STOYAN
分类号 A61N5/00 主分类号 A61N5/00
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