发明名称 Layer configuration with improved stability to sunlight exposure
摘要 A layer configuration on a support, the layer configuration comprising a layer containing a polymer containing optionally substituted 3,4-alkylenedioxythiophene structural units, in which the two alkoxy groups may be the same or different or together represent an optionally substituted oxy-alkylene-oxy bridge, and a compound selected from the group consisting of polyphosphoric acids, polyphosphoric acid salts, thia-alkanedicarboxylic acids, cyclohexadiene compounds and polyhydroxy-compounds selected from the group consisting of tetronic acid derivatives; ortho-dihydroxybenzene compounds with at least one sulpho group, compounds according to formula (I): <?in-line-formulae description="In-line Formulae" end="lead"?>HO-CH<SUB>2</SUB>-CH(OH)-(CH<SUB>2</SUB>)<SUB>m</SUB>-S-CH<SUB>2</SUB>-C(R<SUP>1</SUP>)(R<SUP>2</SUP>)-CH<SUB>2</SUB>-S-(CH<SUB>2</SUB>)<SUB>n</SUB>-CH(OH)-CH<SUB>2</SUB>-OH (I)<?in-line-formulae description="In-line Formulae" end="tail"?> wherein R<SUP>1 </SUP>and R<SUP>2 </SUP>are independently H, -OH or alkyl, and n and m are independently 1, 2 or 3; compounds according to formula (II): <?in-line-formulae description="In-line Formulae" end="lead"?>HO-(CH<SUB>2</SUB>)<SUB>p</SUB>-S-CH<SUB>2</SUB>-S-(CH<SUB>2</SUB>)<SUB>q</SUB>-OH (II)<?in-line-formulae description="In-line Formulae" end="tail"?> wherein p and q are independently 2, 3 or 4; compounds hydrolyzable to tetronic acid derivatives; compounds hydrolyzable to compounds according to formula (I); and sulpho-substituted 2-thia-alkyl-benzimidazole compounds.
申请公布号 US7147936(B2) 申请公布日期 2006.12.12
申请号 US20030642933 申请日期 2003.08.18
申请人 AGFA GEVAERT 发明人 LOUWET FRANK;VAN DYCK GEERT;LOCCUFIER JOHAN;GROENENDAAL BERT;ANDRIESSEN HIERONYMUS
分类号 C08G61/12;C08L25/08;C09J165/00;H01L51/50 主分类号 C08G61/12
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