发明名称 METHOD AND DEVICE FOR IMPRINTING BY BACK PRESSURIZATION
摘要 PROBLEM TO BE SOLVED: To perform accurate imprinting even when a mold and a sample are somewhat bad in flatness, to suppress formation of an isolated noncontact area when the mold and sample come into contact with each other, and to make a pressure distribution on a contact plane between the mold and sample uniform in an easy method. SOLUTION: A substrate holding member 2 holds a circumference of a thin substrate 1, a structure 7 for pressurization is arranged below the substrate 1 to freely move up and down, and the mold 4 is arranged above the substrate 1 opposite to the structure 7 for pressurization; and the structure 7 for pressurization is elevated to press the reverse surface 6 of the substrate 1, and the top surface 3 of the substrate 1 is pressed against the mold 4 above the holding position (a) of the substrate 1 for imprinting. The structure 7 for pressurization is made of a substance which is more flexible than the substrate 1 and mold 4 to achieve more uniform imprinting. COPYRIGHT: (C)2007,JPO&INPIT
申请公布号 JP2006332391(A) 申请公布日期 2006.12.07
申请号 JP20050154854 申请日期 2005.05.27
申请人 NATIONAL INSTITUTE OF ADVANCED INDUSTRIAL & TECHNOLOGY 发明人 HIROSHIMA HIROSHI
分类号 H01L21/027 主分类号 H01L21/027
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