发明名称 Trench-gate field effect transistors and methods of forming the same
摘要 A field effect transistor includes a body region of a first conductivity type over a semiconductor region of a second conductivity type. A gate trench extends through the body region and terminates within the semiconductor region. At least one conductive shield electrode is disposed in the gate trench. A gate electrode is disposed in the gate trench over but insulated from the at least one conductive shield electrode. A shield dielectric layer insulates the at lease one conductive shield electrode from the semiconductor region. A gate dielectric layer insulates the gate electrode from the body region. The shield dielectric layer is formed such that it flares out and extends directly under the body region.
申请公布号 US2006273386(A1) 申请公布日期 2006.12.07
申请号 US20060441386 申请日期 2006.05.24
申请人 YILMAZ HAMZA;CALAFUT DANIEL;KOCON CHRISTOPHER B;SAPP STEVEN P;PROBST DEAN E;KRAFT NATHAN L;GREBS THOMAS E;RIDLEY RODNEY S;DOLNY GARY M;MARCHANT BRUCE D;YEDINAK JOSEPH A 发明人 YILMAZ HAMZA;CALAFUT DANIEL;KOCON CHRISTOPHER B.;SAPP STEVEN P.;PROBST DEAN E.;KRAFT NATHAN L.;GREBS THOMAS E.;RIDLEY RODNEY S.;DOLNY GARY M.;MARCHANT BRUCE D.;YEDINAK JOSEPH A.
分类号 H01L29/94 主分类号 H01L29/94
代理机构 代理人
主权项
地址