| 摘要 |
A projection lens of a microlithographic projection exposure system comprises a number of optical elements (15, 16, 18, 20, L1 to L4). A selected optical element (20), e.g. a mirror, can be deformed by exerting a mechanical force generated by an actuator (30, 130, 330, 430, 530). With the aid of a manipulator (26a, 26b, 26c, 126a, 126b, 226a, 226b, 326a, 326b, 326c, 426a, 426b, 426c, 526b) the spatial position of one of the optical elements and, in particular, of the deformed optical element (20) can be altered depending on the force exerted y the actuator (30; 130, 330, 430, 530). This enables tipping movements or other changes in position, which occur due to the interaction of a mounting (22a, 22b, 22c, 122a, 122b, 222a, 222b) and the forces generated by the actuator (30, 130, 330, 430, 530), to be canceled once again at least in part.
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