OPTICAL PROXIMITY CORRECTION SYSTEM AND METHOD THEREOF

摘要

An OPC(Optical Proximity Correction) system and a method are provided to enhance the exactness of OPC and to consider properly the shape and arrangement of patterns. An OPC system(100) includes an IC(Integrated Circuit) layout generating apparatus(140) for generating an IC layout(150), a database apparatus for storing the information on OPC models according to the shape and arrangement of patterns, and a mask layout generating apparatus(160) for generating a mask layout using the IC layout. The mask layout generating apparatus includes a model selecting unit(165) for selecting a proper model out of the OPC models on the basis of the shape and arrangement of patterns.