| 摘要 |
A micromirror array 110 fabricated on a semiconductor substrate 11 . The array 110 is comprised of four operating layers 12, 13, 14, 15 . An addressing layer 12 is fabricated on the substrate. A raised electrode layer 13 is spaced above the addressing layer by an air gap. A hinge layer 14 is spaced above the raised electrode layer 13 by another air gap. A mirror layer 15 is spaced over the hinge layer 14 by a third air gap.
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