发明名称 |
SEMICONDUCTOR DEVICE AND METHOD FOR MANUFACTURING THE SAME |
摘要 |
A semiconductor device and its manufacturing method are provided to economize fabrication costs and to reduce device size by embodying micro-machine composed of a micro-structure and a semiconductor element on the same insulating substrate. A semiconductor device includes an electric circuit and a micro-structure. The electric circuit is formed on a substrate, wherein the electric circuit includes a semiconductor element. The micro-structure(119) is formed on the same substrate. The micro-structure includes a polycrystalline silicon layer. The polycrystalline silicon layer is obtained from a laser crystallization or thermal crystallization. |
申请公布号 |
KR20060122751(A) |
申请公布日期 |
2006.11.30 |
申请号 |
KR20060047344 |
申请日期 |
2006.05.26 |
申请人 |
SEMICONDUCTOR ENERGY LABORATORY K.K. |
发明人 |
IZUMI KONAMI;YAMAGUCHI MAYUMI |
分类号 |
H01L21/268;H01L21/20;H01L21/324 |
主分类号 |
H01L21/268 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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