发明名称 SEMICONDUCTOR DEVICE AND METHOD FOR MANUFACTURING THE SAME
摘要 A semiconductor device and its manufacturing method are provided to economize fabrication costs and to reduce device size by embodying micro-machine composed of a micro-structure and a semiconductor element on the same insulating substrate. A semiconductor device includes an electric circuit and a micro-structure. The electric circuit is formed on a substrate, wherein the electric circuit includes a semiconductor element. The micro-structure(119) is formed on the same substrate. The micro-structure includes a polycrystalline silicon layer. The polycrystalline silicon layer is obtained from a laser crystallization or thermal crystallization.
申请公布号 KR20060122751(A) 申请公布日期 2006.11.30
申请号 KR20060047344 申请日期 2006.05.26
申请人 SEMICONDUCTOR ENERGY LABORATORY K.K. 发明人 IZUMI KONAMI;YAMAGUCHI MAYUMI
分类号 H01L21/268;H01L21/20;H01L21/324 主分类号 H01L21/268
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