| 摘要 |
An apparatus for dispensing gas and a chamber with the same are provided to minimize a thermally induced mechanical stress in a gas dispensing plate and prevent damage and transformation of the gas dispensing plate by maintaining it at high temperature. A chamber wall(10) includes a gas introduction manifold upper wall, which has at least one gas introduction orifice. A gas dispensing plate(20) includes at least one gas discharge orifice. A hanger portion(24) includes at least one gas introduction manifold side wall. At least a part of the gas introduction manifold side wall is flexible. The gas introduction manifold side wall includes a lower portion connected to the gas dispensing plate. An upper portion of the gas introduction manifold side wall is connected to the gas introduction manifold upper wall so that the gas dispensing plate is hung to a lower side of the gas introduction manifold upper wall, a flexible part of each side wall is positioned at an upper side of the gas dispensing plate, and between the gas introduction manifold upper wall and the gas dispensing plate. |
