METHOD FOR REMOVING MICRO SCRATCHING IN DIELECTRIC LAYER OCCURRING BY CHEMICAL MECHANICAL POLISHING AND METHOD FOR FORMING ISOLATION LAYER USING THE SAME,申请号KR20000036505-传众专利搜索

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发明名称	METHOD FOR REMOVING MICRO SCRATCHING IN DIELECTRIC LAYER OCCURRING BY CHEMICAL MECHANICAL POLISHING AND METHOD FOR FORMING ISOLATION LAYER USING THE SAME
摘要
申请公布号	KR100650711(B1)	申请公布日期	2006.11.27
申请号	KR20000036505	申请日期	2000.06.29
申请人		发明人
分类号	H01L21/76	主分类号	H01L21/76
代理机构		代理人
主权项
地址

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