| 摘要 |
Diffusion equipment for manufacturing a semiconductor device is provided to prevent degradation of a sealing member and gas leakage in a reaction tube by contacting the sealing member to a cooling path. Diffusion equipment includes a flange(200), a reaction tube(100) closed on the flange for performing a diffusion process, a sealing member(300) located between the flange and the reaction tube, and a cooling path(400) located at the flange for contacting with the sealing member. The cooling path further includes a contact groove and a contact plane.
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