APPARATUS FOR PROCESSING A SEMICONDUCTOR SUBSTRATE

摘要

An apparatus for processing a semiconductor substrate is provided to effectively and accurately process plural semiconductor substrates at the same time by preventing damages to an injector. An apparatus for processing a semiconductor substrate includes a tube(110), a boat(120), a heater(150), and a gas supply unit(160). The tube confines a space, in which the semiconductor substrate is processed. Plural semiconductor substrates are stacked in multiple layers. The semiconductor substrates are elevated inside the tube by the boat. The heater heats up an inner portion of the tube from outside the tube. The gas supply unit is elongated into the tube and supplies process gas for performing various processes. The gas supply unit is made of a metal alloy, such that the gas supply unit is protected from pollutants, which are generated by the process gas.