发明名称 |
FORMING METHOD OF WIRING PATTERN, DEVICE, NONCONTACT CARD MEDIUM, PHOTOELECTRIC DEVICE, AND ACTIVE MATRIX SUBSTRATE |
摘要 |
PROBLEM TO BE SOLVED: To impart functionality to a pattern that is not acquired from a single kind of material by laminating a plurality of materials to form the pattern. SOLUTION: The method of forming a pattern by arranging a functional liquid on a substrate includes a process in which a bank B corresponding to a pattern forming region is formed on the substrate P, a process in which a first functional liquid X1 is arranged between the banks 34, a process in which a second functional liquid X2 is arranged on the first functional liquid X1 that has been arranged, and a process to form the pattern 33 in which a plurality of materials are laminated by subjecting the first functional liquid X1 laminated between the banks and the second functional liquid X2 to a specified process. COPYRIGHT: (C)2007,JPO&INPIT |
申请公布号 |
JP2006313916(A) |
申请公布日期 |
2006.11.16 |
申请号 |
JP20060135553 |
申请日期 |
2006.05.15 |
申请人 |
SEIKO EPSON CORP |
发明人 |
HIRAI TOSHIMITSU |
分类号 |
H01L21/3205;B05D1/26;G02F1/1343;G02F1/1368;H01L21/28;H01L21/288;H01L21/336;H01L23/52;H01L29/786 |
主分类号 |
H01L21/3205 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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