| 摘要 |
An exposure apparatus capable of preventing thermal deformation of reticle and an exposure method therefor are provided to directly detect temperature variation of each of reticles and continuously retain the temperature to the saturation temperature in reticle library and reticle stage by fabricating a reticle storage element containing multiple reticles and the reticle stage for transferring patterns in the apparatus. The exposure apparatus(100) comprises: a reticle storage element(110) for holding multiple reticles; and a reticle stage(130) on which the exposure process is carried out so as to transfer the reticle pattern to a subject to be patterned. The reticle storage element holds the multiple reticles separately and has multiple slots with temperature variable function to retain the reticles at saturation temperature on the reticle stage during the exposure. Each of the multiple slots has temperature variable device for heating and cooling the slot, which includes thermoelectric semiconductor, and temperature sensor.
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