发明名称 GaN semiconductor devices with A1N buffer grown at high temperature and method for making the same
摘要 A method for growing high-quality single crystal III-V compound semiconductor layers of nitrides on a substrate that has a large lattice mismatch including first forming an AIN layer on a substrate, and then forming a GaN layer on the AIN layer.
申请公布号 US2006249741(A1) 申请公布日期 2006.11.09
申请号 US20060410995 申请日期 2006.04.25
申请人 CAO GROUP, INC. 发明人 WANG TAO
分类号 H01L33/00 主分类号 H01L33/00
代理机构 代理人
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