| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide lithography equipment having reduced a relative position error between a first movable part and a second movable part, a position amount controller, and a control method. <P>SOLUTION: The lithography equipment comprises a first movable element and a first control system for controlling the position amount of the first movable element. Further, the lithography equipment comprises a second movable element and a second control system for controlling the position amount of the second movable element. In order to reduce a tracking error, that is, a relative error between the first movable part and the second movable part, a feed forward table is provided as comprising feed forward table programming for generating a feed forward signal in synchronization with a set value signal to be provided to the first and second control systems. In order to correct the position amount of the first movable element to reduce the relative error between the position amount of the first movable element and the position amount of the second movable element, a feed forward is provided to the first control system. <P>COPYRIGHT: (C)2007,JPO&INPIT |
