发明名称 Method to reduce ferric ions in ferrous based plating baths
摘要 A process for cathodically reducing unwanted Fe<SUP>+3 </SUP>ions to needed Fe<SUP>+2 </SUP>ions in an acidic ferrous based plating bath without reducing agents is disclosed. An auxiliary potential of 0.1 to 0.3 volts vs. SCE is applied between the working electrode and a reference electrode and can reduce the molar ratio [Fe<SUP>+3</SUP>]/[Fe<SUP>+2</SUP>] to 1 ppm without depositing Fe or other metals on the working electrode or causing hydrogen evolution. The process is applicable to electroplating soft magnetic films such as NiFe, FeCo, and CoNiFe and can be performed during plating or during cell idling. The process is cost effective by reducing the amount of hazardous waste and tool down time due to routine solution swap. Other benefits are improved uniformity in composition and thickness of plated films because issues associated with decomposed reducing agents are avoided.
申请公布号 US2006249392(A1) 申请公布日期 2006.11.09
申请号 US20050122847 申请日期 2005.05.05
申请人 HEADWAY TECHNOLOGIES, INC. 发明人 CHEN CHAO-PENG;CHUDASAMA JAS;LAM SITUAN
分类号 C25B1/00;C25D3/20 主分类号 C25B1/00
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