| 摘要 |
The present invention is an exposure apparatus that exposes a substrate through a projection optical system and a liquid, comprising: a first nozzle member, which is provided in the vicinity of the image plane side of the projection optical system, that has a supply port that supplies the liquid and a first recovery port that recovers the liquid; and a second nozzle member, which is provided on the outer side of the first nozzle member with respect to a projection area of the projection optical system, that has a second recovery port, which recovers the liquid, that is separate from the first recovery port. The first nozzle member and the second nozzle member are mutually independent members.
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