发明名称 PROCESS FOR PRODUCING SEMICONDUCTOR DEVICE AND SEMICONDUCTOR DEVICE
摘要 <p>A process for producing a semiconductor device, in which the performance of semiconductor element including a single-crystal semiconductor layer formed on an insulating substrate by transfer can be enhanced. There is provided a process for producing a semiconductor device having a single-crystal semiconductor layer superimposed on an insulating substrate, comprising the steps of injecting a peeling substance into a single-crystal semiconductor substrate to thereby form a peeling layer; through separation by the peeling layer, transferring part of the single-crystal semiconductor substrate onto an insulating substrate to thereby form a single-crystal semiconductor layer; forming a hydrogen-containing layer on at least one surface side of the single-crystal semiconductor layer; and diffusing hydrogen from the hydrogen-containing layer into the single-crystal semiconductor layer.</p>
申请公布号 WO2006117900(A1) 申请公布日期 2006.11.09
申请号 WO2006JP300537 申请日期 2006.01.17
申请人 SHARP KABUSHIKI KAISHA;MORIGUCHI, MASAO;TAKAFUJI, YUTAKA;DROES, STEVEN, ROY 发明人 MORIGUCHI, MASAO;TAKAFUJI, YUTAKA;DROES, STEVEN, ROY
分类号 H01L21/02;H01L21/20;H01L21/336;H01L27/12;H01L29/786 主分类号 H01L21/02
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