PROCESS FOR PRODUCING SEMICONDUCTOR DEVICE AND SEMICONDUCTOR DEVICE
摘要
<p>A process for producing a semiconductor device, in which the performance of semiconductor element including a single-crystal semiconductor layer formed on an insulating substrate by transfer can be enhanced. There is provided a process for producing a semiconductor device having a single-crystal semiconductor layer superimposed on an insulating substrate, comprising the steps of injecting a peeling substance into a single-crystal semiconductor substrate to thereby form a peeling layer; through separation by the peeling layer, transferring part of the single-crystal semiconductor substrate onto an insulating substrate to thereby form a single-crystal semiconductor layer; forming a hydrogen-containing layer on at least one surface side of the single-crystal semiconductor layer; and diffusing hydrogen from the hydrogen-containing layer into the single-crystal semiconductor layer.</p>
申请公布号
WO2006117900(A1)
申请公布日期
2006.11.09
申请号
WO2006JP300537
申请日期
2006.01.17
申请人
SHARP KABUSHIKI KAISHA;MORIGUCHI, MASAO;TAKAFUJI, YUTAKA;DROES, STEVEN, ROY
发明人
MORIGUCHI, MASAO;TAKAFUJI, YUTAKA;DROES, STEVEN, ROY