发明名称 HONEYCOMB STRUCTURE CONTAINING Si AND METHOD FOR MANUFACTURE THEREOF
摘要 A honeycomb structure 1 has a large number of through-holes 3 divided by partition walls 2 and extending in the axial direction, characterized in that the honeycomb structure contains a Si phase having a lattice constant controlled at 0.54302 to 0.54311 nm at room temperature. A process for producing the honeycomb structure 1, includes a firing step of firing a precursor of honeycomb structure, wherein the precursor contains a Si phase and the firing step is conducted using a furnace material free from any boron-containing compound. A process for producing the honeycomb structure 1, includes a firing step of firing a precursor of honeycomb structure, wherein a reduction percentage of Si content in Si phase after firing step relative to Si content in Si phase before firing step is suppressed at 10% by mass or less. Having an improved thermal conductivity, the honeycomb structure is superior in thermal shock resistance. <IMAGE>
申请公布号 EP1469172(A4) 申请公布日期 2006.11.08
申请号 EP20030701853 申请日期 2003.01.24
申请人 NGK INSULATORS, LTD. 发明人 ICHIKAWA, SHUICHI;HARADA, TAKASHI;OTSUKA, AIKO;WADA, YUKIHISA;YAMAMOTO, YOSHINORI
分类号 F01N3/02;B01D39/20;B01D46/24;B01J21/08;B01J27/224;B01J35/04;B01J37/08;B01J37/34;B28B3/26;C04B35/117;C04B35/185;C04B35/488;C04B35/505;C04B38/00;F01N3/022;F01N3/28 主分类号 F01N3/02
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