发明名称 PHOTODETECTING DEVICE
摘要 A method of manufacturing a photodetecting device, by providing a first wafer that includes a photosensitive layer made of a semiconductor material and a second wafer that includes a circuit layer of electronic components, with one of the photosensitive layer or the circuit layer incorporating a field isolation layer; bonding the first and second wafers to form a structure comprising successively the circuit layer, the field isolation layer and the photosensitive layer; and forming electrically conductive vias to electrically connect the photosensitive layer to at least some of the electronic components of the circuit layer. Also, photodetecting devices prepared by these methods.
申请公布号 EP1719179(A1) 申请公布日期 2006.11.08
申请号 EP20040714396 申请日期 2004.02.25
申请人 S.O.I.TEC SILICON ON INSULATOR TECHNOLOGIES 发明人 DUPONT, FREDERIC;CAYREFOURCQ, IAN
分类号 H01L27/146;H01L31/028;H01L31/0368;H01L31/18 主分类号 H01L27/146
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