发明名称 |
CRUCIBLE OF VAPOR DEPOSITION APPARATUS AND VAPOR DEPOSITION SOURCE HAVING THE SAME |
摘要 |
A crucible of a vacuum deposition apparatus and a vapor deposition source using the same are provided to realize a uniform consumption of a predetermined material by using an improved arrangement of a spraying nozzle and a tilted inner bottom of the crucible. A crucible(220) has an inner space capable of storing a deposition material. A spraying nozzle(240) is connected through the crucible in order to spray the deposition material onto an aiming portion. The crucible includes a predetermined inner bottom portion. The predetermined inner bottom portion of the crucible has a slope. The spraying nozzle is installed at an upper portion of the crucible. The upper portion is higher than the center of the crucible.
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申请公布号 |
KR100645687(B1) |
申请公布日期 |
2006.11.06 |
申请号 |
KR20050080282 |
申请日期 |
2005.08.30 |
申请人 |
SAMSUNG SDI CO., LTD. |
发明人 |
JEONG, MIN JAE;KANG, HEE CHEOL |
分类号 |
H01L21/20;H01L21/203;H01L21/205 |
主分类号 |
H01L21/20 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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