发明名称 CRUCIBLE OF VAPOR DEPOSITION APPARATUS AND VAPOR DEPOSITION SOURCE HAVING THE SAME
摘要 A crucible of a vacuum deposition apparatus and a vapor deposition source using the same are provided to realize a uniform consumption of a predetermined material by using an improved arrangement of a spraying nozzle and a tilted inner bottom of the crucible. A crucible(220) has an inner space capable of storing a deposition material. A spraying nozzle(240) is connected through the crucible in order to spray the deposition material onto an aiming portion. The crucible includes a predetermined inner bottom portion. The predetermined inner bottom portion of the crucible has a slope. The spraying nozzle is installed at an upper portion of the crucible. The upper portion is higher than the center of the crucible.
申请公布号 KR100645687(B1) 申请公布日期 2006.11.06
申请号 KR20050080282 申请日期 2005.08.30
申请人 SAMSUNG SDI CO., LTD. 发明人 JEONG, MIN JAE;KANG, HEE CHEOL
分类号 H01L21/20;H01L21/203;H01L21/205 主分类号 H01L21/20
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