发明名称 FORMATION METHOD OF CONDUCTIVE FILM AND MANUFACTURING METHOD OF ELECTRONIC APPARATUS
摘要 <P>PROBLEM TO BE SOLVED: To provide a method for forming a low-resistance conductive film having a stable electrical characteristic by using a liquid phase method. <P>SOLUTION: This formation method of a conductive film includes processes of: arranging a liquid material 12 containing a fine particle material on a substrate P; and forming the conductive film by baking the liquid material 12 on the substrate P by light radiation using a flash lamp. <P>COPYRIGHT: (C)2007,JPO&INPIT
申请公布号 JP2006302679(A) 申请公布日期 2006.11.02
申请号 JP20050123193 申请日期 2005.04.21
申请人 SEIKO EPSON CORP 发明人 DENDA ATSUSHI
分类号 H01B13/00;B05D5/12;H01L21/288;H01L21/3205;H01L21/336;H01L29/786 主分类号 H01B13/00
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