发明名称 |
METHOD FOR THERMAL DEVELOPMENT OF PHOTOSENSITIVE ELEMENT USING ORIENTED DEVELOPMENT MEDIUM |
摘要 |
<P>PROBLEM TO BE SOLVED: To provide a method for forming a relief pattern from a photosensitive element containing a composition layer capable of being partially liquefied by heating. <P>SOLUTION: The liquefied portion of the composition layer is removed by contact with a development medium having a predetermined directionality. The directionality of the development medium is oriented to increase the peel strength of the development medium for removal of the development medium from the photosensitive element. <P>COPYRIGHT: (C)2007,JPO&INPIT |
申请公布号 |
JP2006301641(A) |
申请公布日期 |
2006.11.02 |
申请号 |
JP20060116074 |
申请日期 |
2006.04.19 |
申请人 |
E I DU PONT DE NEMOURS & CO |
发明人 |
HACKLER MARK A;KANNURPATTI ANANDKUMAR R;WEAVER SHEILA |
分类号 |
G03F7/34;G03F7/00;G03F7/004 |
主分类号 |
G03F7/34 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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