发明名称 METHOD FOR THERMAL DEVELOPMENT OF PHOTOSENSITIVE ELEMENT USING ORIENTED DEVELOPMENT MEDIUM
摘要 <P>PROBLEM TO BE SOLVED: To provide a method for forming a relief pattern from a photosensitive element containing a composition layer capable of being partially liquefied by heating. <P>SOLUTION: The liquefied portion of the composition layer is removed by contact with a development medium having a predetermined directionality. The directionality of the development medium is oriented to increase the peel strength of the development medium for removal of the development medium from the photosensitive element. <P>COPYRIGHT: (C)2007,JPO&INPIT
申请公布号 JP2006301641(A) 申请公布日期 2006.11.02
申请号 JP20060116074 申请日期 2006.04.19
申请人 E I DU PONT DE NEMOURS & CO 发明人 HACKLER MARK A;KANNURPATTI ANANDKUMAR R;WEAVER SHEILA
分类号 G03F7/34;G03F7/00;G03F7/004 主分类号 G03F7/34
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