LIQUID IMMERSION LITHOGRAPHY SYSTEM COMPRISING A TILTED SHOWERHEAD

摘要

A liquid immersion lithography system includes projection optics (PL) and a showerhead (604). The projection optics are configured to expose a substrate (W) with a patterned beam. The showerhead includes a first nozzle (610) and a second nozzle (612) that are configured to be at different distances from a surface of the substrate during an exposure operation.