发明名称 EXPOSURE DEVICE, EXPOSURE METHOD, AND DEVICE MANUFACTURING METHOD
摘要 <p>An exposure device includes: liquid-immersion space forming member (70) for forming a liquid immersion space by filling an optical path space (K1) of exposure light (EL) with a first liquid (LQ); and a temperature regulating mechanism (60) for suppressing the temperature change of the liquid-immersion space forming member (70) accompanying the release of formation of the liquid immersion space.</p>
申请公布号 WO2006112436(A1) 申请公布日期 2006.10.26
申请号 WO2006JP308040 申请日期 2006.04.17
申请人 NIKON CORPORATION;NAGASAKA, HIROYUKI;SHIRAISHI, KENICHI;FUJIWARA, TOMOHARU;OWA, SOICHI;MIWA, AKIHIRO 发明人 NAGASAKA, HIROYUKI;SHIRAISHI, KENICHI;FUJIWARA, TOMOHARU;OWA, SOICHI;MIWA, AKIHIRO
分类号 H01L21/027;G03F7/20 主分类号 H01L21/027
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