| 摘要 |
PROBLEM TO BE SOLVED: To provide an oblique vapor deposition film element which does not cause decrease in qualities such as decrease in transmittance for rays and changes in retardation when the element is used as a phase difference element and which can be extremely easily and efficiently manufactured. SOLUTION: The oblique vapor deposition element comprises a transparent glass substrate 21 such as quartz glass and an oblique vapor deposition film layer deposited on the glass substrate 21. The oblique vapor deposition film layer consists of a multilayer film formed by alternately depositing a first kind of oblique vapor deposition films 22 having steep inclination (at≥60°inclination angle) and a second kind of oblique vapor deposition films having gentle inclination (at≤25°inclination angle). The second oblique vapor deposition films 23 with gentle inclination are formed by ion-assist vapor deposition. COPYRIGHT: (C)2007,JPO&INPIT
|
