发明名称 |
PROJECTION OBJECTIVE HAVING A HIGH APERTURE AND A PLANAR END SURFACE |
摘要 |
A projection objective for imaging a pattern provided in an object plane of the projection objective onto an image plane of the projection objective suitable for microlithography projection exposure machines has a plurality of optical elements transparent for radiation at an operating wavelength of the projection objective. At least one optical element is a high-index optical element made from a high-index material with a refractive index n >= 1.6 at the operating wavelength.
|
申请公布号 |
KR20060109935(A) |
申请公布日期 |
2006.10.23 |
申请号 |
KR20067011811 |
申请日期 |
2004.12.10 |
申请人 |
CARL ZEISS SMT AG |
发明人 |
BEDER SUSANNE;SINGER WOLFGANG |
分类号 |
G02B13/18;G01B13/00;G01B17/00;G02B17/00;G03F7/20 |
主分类号 |
G02B13/18 |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|