| 摘要 |
PROBLEM TO BE SOLVED: To efficiently clean an cleaning object such as a semiconductor wafer. SOLUTION: A system has a cleaning device 10 for cleaning the cleaning object by using a persulfuric acid solution as a cleaning liquid; an electrolytic reaction device 20 for regenerating the persulfuric acid solution by an electrolytic reaction; and circulation lines 1, 3 for circulating the solution between the cleaning device and the electrolytic reaction device. The cleaning device 10 is provided with cleaning tanks 11, 12 and 13 formed by partitioning a tank into a plurality of sections in the flowing direction of the cleaning solution by partitioning portions 14, 15. The partitioning portions 14, 15 each allow the cleaning liquid to pass. With this configuration, since the persulfuric acid solution can be regenerated and used for cleaning, efficient cleaning can be continued without requiring to add chemical liquid such as hydrogen peroxide or ozone from the outside. The cleaning object can be efficiently cleaned while the cleaning liquid remains in each of the partitioned cleaning tanks, or a dissolved product can be efficiently discomposed. COPYRIGHT: (C)2007,JPO&INPIT
|
