| 摘要 |
PROBLEM TO BE SOLVED: To provide a substrate processing apparatus capable of preventing defective drying of a substrate. SOLUTION: A processing tank 4 is provided in the lower part of a downflow duct 20. The processing tank 4 is formed of an inner tank 40 capable of accommodating a plurality of substrates W, and an external tank 43 provided so as to surround the upper part of external periphery of the internal tank 40. A processing liquid supply pipe 41 for supplying a processing liquid into the internal tank 40, and a processing liquid discharging pipe 42 for discharging the processing liquid in the internal tank 40, are connected to the bottom of the internal tank 40. A processing liquid discharge pipe 44 for discharging a processing liquid flowing from the internal tank 40 and flowing into the external tank 43 is connected to the bottom of the internal tank 43. A plurality of through-holes 40h are formed on the top of the side wall of the internal tank 40. Also, in the side wall of the internal tank 40, a liquid surface adjusting shutter 40s capable of opening/closing the through-holes 40h and a shutter driver 40D are provided in the vicinity of the through holes 40h. A control unit 70 controls the shutter driver 40D, thereby controlling the opening/closing operations of the through-holes 40h. COPYRIGHT: (C)2007,JPO&INPIT
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