| 摘要 |
PROBLEM TO BE SOLVED: To provide a processing apparatus capable of uniformly processing even a object to be processed having a large area. SOLUTION: The apparatus has a vacuum container 10 having an electromagnetic wave incident surface F to which an electromagnetic wave is incident and capable of placing a substrate 100 to be processed in its inside, a gas introducing system of at least one systems 50, 60 provided on the vacuum container 10 and having gas introducing pipes 51, 61 for introducing a gas into the vacuum container 10, and a scanning antenna 20 for making an electromagnetic wave incident into the vacuum container 10 through the electromagnetic wave incident surface F. The apparatus is configured so that the gas is excited by the electromagnetic wave from the scanning antenna 20 to generate a plasma, thereby processing the substrate 100. COPYRIGHT: (C)2007,JPO&INPIT
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