PHOTORESIST COMPOSITION FOR DEEP UV AND PROCESS THEREOF,申请号EP20040806545-传众专利搜索

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发明名称	PHOTORESIST COMPOSITION FOR DEEP UV AND PROCESS THEREOF
摘要
申请公布号	EP1709485(A2)	申请公布日期	2006.10.11
申请号	EP20040806545	申请日期	2004.11.23
申请人	AZ ELECTRONIC MATERIALS USA CORP.	发明人	RAHMAN, M., DALIL
分类号	G03F7/00;G03F7/039	主分类号	G03F7/00
代理机构		代理人
主权项
地址

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