发明名称 Monolithically integrated circuit comprising a thin film resistor, and fabrication method thereof
摘要 A monolithically integrated circuit comprises a thin film resistor ( 8 ) with low resistance and low temperature coefficient; a high frequency lateral power transistor device ( 9 ) including gate ( 17 ), source ( 16 ) and drain ( 15 ) regions, and a Faraday shield layer region ( 22; 22 ') above the gate region; and at least a first metallization layer ( 28 ) there above for electrical connection of the gate ( 17 ), source ( 16 ) and drain ( 15 ) regions through via holes filled with conductive material ( 29 c-d). The thin film resistor ( 8 ) and the Faraday shield layer region ( 22; 22 ') are made in the same conductive layer, which is arranged below the first metallization layer ( 28 ).
申请公布号 US7119415(B2) 申请公布日期 2006.10.10
申请号 US20040946932 申请日期 2004.09.22
申请人 INFINEON TECHNOLOGIES AG 发明人 NORSTROEM HANS;JOHANSSON TED
分类号 H01L27/04;H01L29/00;H01L21/822;H01L21/8234;H01L21/8249;H01L27/06;H01L29/06;H01L29/417;H01L29/45;H01L29/49;H01L29/78 主分类号 H01L27/04
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