发明名称 |
Monolithically integrated circuit comprising a thin film resistor, and fabrication method thereof |
摘要 |
A monolithically integrated circuit comprises a thin film resistor ( 8 ) with low resistance and low temperature coefficient; a high frequency lateral power transistor device ( 9 ) including gate ( 17 ), source ( 16 ) and drain ( 15 ) regions, and a Faraday shield layer region ( 22; 22 ') above the gate region; and at least a first metallization layer ( 28 ) there above for electrical connection of the gate ( 17 ), source ( 16 ) and drain ( 15 ) regions through via holes filled with conductive material ( 29 c-d). The thin film resistor ( 8 ) and the Faraday shield layer region ( 22; 22 ') are made in the same conductive layer, which is arranged below the first metallization layer ( 28 ).
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申请公布号 |
US7119415(B2) |
申请公布日期 |
2006.10.10 |
申请号 |
US20040946932 |
申请日期 |
2004.09.22 |
申请人 |
INFINEON TECHNOLOGIES AG |
发明人 |
NORSTROEM HANS;JOHANSSON TED |
分类号 |
H01L27/04;H01L29/00;H01L21/822;H01L21/8234;H01L21/8249;H01L27/06;H01L29/06;H01L29/417;H01L29/45;H01L29/49;H01L29/78 |
主分类号 |
H01L27/04 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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