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发明名称
METHOD FOR FABRICATING A FIELD OXIDE IN A SEMICONDUCTOR DEVICE
摘要
申请公布号
KR100632034(B1)
申请公布日期
2006.10.04
申请号
KR20040113663
申请日期
2004.12.28
申请人
发明人
分类号
H01L21/762
主分类号
H01L21/762
代理机构
代理人
主权项
地址
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