| 摘要 |
There is provided a pellicle container for use in photolithography, with which no dust particles are deposited onto the pellicle contained therein, and contamination of the pellicle can be prevented and good condition is ensured. The present invention provides a pellicle container consisting of a container base on which a pellicle is mounted, and a covering body that covers the pellicle and latches with the container base by engagement together with the container base along the peripheral edges, wherein the pellicle is supported by inserting a frame supporting pin in the opening of a sleeve provided on the outside surface of the pellicle frame. Preferably, the container base is made from a plastic resin and a metal component is joined to the container base; the metal component fixedly connected to the container base is mechanically connected to a positioning component that positions the frame supporting pin that supports the pellicle; and an elastic member is disposed on the point of contact between the frame supporting pin that supports the pellicle and the pellicle frame. It is even more preferable that the container boase and the Icovering body are made of a plastic resin, and these have antistatic performance such that their surface resistivity is no higher than 1x10<SUP>12 </SUP>ohms.
|
